Please use this identifier to cite or link to this item: http://sutir.sut.ac.th:8080/jspui/handle/123456789/10140
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dc.contributor.advisorWorawat Meevasanaen_US
dc.contributor.authorSuwat Thilaen_US
dc.date.accessioned2024-10-11T02:32:56Z
dc.date.available2024-10-11T02:32:56Z
dc.date.issued2021
dc.identifier.urihttp://sutir.sut.ac.th:8080/jspui/handle/123456789/10140
dc.language.isoenen_US
dc.publisherSchool of Physics Institute of Science Suranaree University of Technologyen_US
dc.subjectPhotoemission electron microscopyen_US
dc.subjectX-rayen_US
dc.subjectX-ray photoemission spectroscopyen_US
dc.subjectHafnium diselenideen_US
dc.titleThe oxidation reactivity at surface of hafnium diselenide in vacuum and atmospheric pressure environmenten_US
dc.title.alternativeปฏิกิริยาออกซิเดชันที่พื้นผิวของแฮฟเนียมไดเซเลไนด์ในสภาวะสุญญากาศและความดันบรรยากาศen_US
dc.typeThesis
dc.degree.nameMaster of Science
dc.degree.levelMaster's Degree
dc.degree.disciplinePhysics
dc.degree.grantorSuranaree University of Technology
Appears in Collections:วิทยานิพนธ์ (Thesis)

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